FUTA Matriculation Ceremony Date, Time and Venue 2017/18

FUTA Mini Matriculation Ceremony Schedule for Absentees 2017/2018

Olusegun Modified: 7th June, 2018 FUTA Mini Matric Date: Monday, June 11, 2018. www.futa.edu.ngThis is to notify all newly admitted students of the Federal University of Technology, Akure (FUTA) and the general public that the management has approved a new date for the 2017/2018 academic session Matriculation Ceremony.The Federal University of Technology, Akure (FUTA) 35th Matriculation Ceremony signalling the formal admittance of Fresh Students for the 2017/2018 Academic Session will now hold as follows:Date: Thursday, 12th April, 2018. Venue: University Main Auditorium. Time: 10:00 AM.Attendance is mandatory for all fresh students as the matriculation register will be signed in the course of the ceremony.Only freshers who sign the matriculation register at the venue will be deemed to have completed their registration as bona fide FUTA students.

Federal University of Technology, Akure, FUTA matriculation ceremony date, time and venue for Absentees for the 2017/2018 academic session.

FUTA matriculation ceremony

I write to inform you that the Vice-Chancellor has approved that a Mini-Matriculation Ceremony be organized for fresh students (UTME and Direct) who were absent during the Matriculation Ceremony held on Thursday, 12th April, 2018.

Consequently, all affected students are hereby directed to pay a sum of Two Thousand Naira (N2,000) only to the coffers of the University on or before Friday, 8th June, 2018. Evidence of payment of the money is one of the criteria for the students to participate in the ceremony.

The ceremony is scheduled to hold as follows:

Date: Monday, 11th June, 2018
Time: 10.00 a. m. Prompt
Venue: T. I. Francis Auditorium

The affected students are to collect their Matriculation gowns from the Admissions Office with the evidence of payment of the penalty fee. No Matriculant would be allowed into the hall without being appropriately robed.

Please give this information a wide publicity.

Thank you.

J. O. Esho
Ag. Director, Academic Affairs

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